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Electrical and optical properties of Co+ ion implanted a-Si1-xCx : H alloys

Emerson, NG, Gwilliam, RM, Shannon, JM, Jeynes, C, Sealy, BJ, Tsvetkova, T, Tzenov, N, Tzolov, M and Dimova-Malinovska, D (2000) Electrical and optical properties of Co+ ion implanted a-Si1-xCx : H alloys NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 160 (4). pp. 505-509.

Full text not available from this repository.
Item Type: Article
Divisions : Surrey research (other units)
Authors :
Gwilliam, RM
Shannon, JM
Sealy, BJ
Tsvetkova, T
Tzenov, N
Tzolov, M
Dimova-Malinovska, D
Date : 1 April 2000
DOI : 10.1016/S0168-583X(99)00630-8
Uncontrolled Keywords : Science & Technology, Technology, Physical Sciences, Instruments & Instrumentation, Nuclear Science & Technology, Physics, Atomic, Molecular & Chemical, Physics, Nuclear, Physics, INSTRUMENTS & INSTRUMENTATION, NUCLEAR SCIENCE & TECHNOLOGY, PHYSICS, ATOMIC, MOLECULAR & CHEMICAL, PHYSICS, NUCLEAR, ion implantation, amorphous semiconductors, new materials synthesis, electrical and optical properties, GROWTH, COSI2
Related URLs :
Depositing User : Symplectic Elements
Date Deposited : 17 May 2017 11:00
Last Modified : 24 Jan 2020 20:12

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